VLSI-International Symposium on VLSI Technology, Systems and Applications

2009 International Symposium on VLSI Technology, Systems and Applications

Time	Monday, April 27			Tuesday, April 28			Wednesday, April 29
9:00- 9:50	Ballroom B	Ballroom A	Ballroom C	BallroomB			Ballroom A	Ballroom D
9:00- 9:50	TSA Plenary K1			Joint Opening & Joint Plenary			TSA Plenary K3
9:50- 11:50	Session 1 Process Module	Session 2 Strain Technology	Session 3 Non-Volatile Memories	Joint Opening & Joint Plenary			Session 10 High Mobility Channel	Session 11 Memories SONOS
11:50	Lunch
13:30- 17:30	Ballroom B	Ballroom A	Ballroom C	Ballroom B	Ballroom D	Mezzanine A+B	Mezzanine A+B	Ballroom D
13:30- 17:30	Session 4 (All Invited) Green Devices	Session 5 High-k/Metal Gate	Session 6 CMOS	Session 7 (All Invited) Next Generation Lithography	Session 8 Scaling Trends and Related Modeling	Session 9 Non-Traditional CMOS	Short course I SIP & 3D IC	Short course II Non-Volatile Memory
18:30				Cocktail Reception (Ballroom B)

website design /
webhosting by fansio